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NANO PRO Gallium Oxide Sputtering Targets Ga2O3

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TA2026
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NANO PRO Gallium Oxide Sputtering Targets Ga2O3

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Specifications Gallium Oxide Sputtering Target Features

To add a Cu Backing Plate with Indium Bonding for Sputtering Targets  

Material Type Gallium Oxide
Symbol Ga2O3
CAS Number 12024-21-4
Purity 99.99% (4N) or 99.999% (5N)
Color/Appearance White, Crystalline Solid
Melting Point (°C) 1,725
Theoretical Density (g/cm3) 5.88
Formula Weight 187.44
Type of Bond Indium
NANOSSR is a premier supplier of quality manufactured sputtering targets; we supply custom chemical compositions, purity and sizes. Our wide variety of targets are grouped by high purity metals, alloys, ceramics, and doped. Our pricing is competitive and we consistently offer price matching for our customers.

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